Hwaseong, South Korea

Geunhee Yang

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Geunhee Yang. Retrieved from https://idiyas.com/inventor/geunhee-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Geunhee Yang - Innovator at Samsung Electronics

Introduction

Geunhee Yang is an accomplished inventor based in Suwon-si, South Korea. He is currently associated with Samsung Electronics Co., Ltd., where he contributes to the development of innovative technologies. Although he has not yet been granted any patents, his work is significant in the field of electronic devices.

Latest Patent Applications

Geunhee Yang's notable patent application is titled "Electronic Device, and Method for Generating Facial Position Information in Interpolated Frames of Electronic Device." This application outlines a method for generating facial position information using a face detection module, an optical flow circuit, and a face tracking module. The process involves receiving a frame and detection data, determining patches of the optical flow map, calculating the estimated position of a face, and generating facial position information in interpolated frames. The detection data includes bounding box information and landmark information of the face.

Conclusion

Geunhee Yang's contributions to Samsung Electronics highlight his innovative approach to technology, particularly in the realm of facial recognition and electronic devices. His ongoing work promises to advance the field further.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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