Gyeonggi-do, South Korea

Geun Sik Yun

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):

Title: Geun Sik Yun: Innovator in Substrate Polishing and Cleaning Technologies

Introduction

Geun Sik Yun is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, particularly in polishing and cleaning technologies. With a total of 2 patents to his name, Yun continues to push the boundaries of innovation in his industry.

Latest Patents

Yun's latest patents include a substrate polishing system and a substrate cleaning line. The substrate polishing system features a substrate transfer unit that comprises a shaft rotating on a rotation axis perpendicular to the ground. This system includes at least one transfer arm that supports the bottom surface of a substrate and transfers it while forming a transfer orbit through the rotation of the shaft. Additionally, it incorporates at least one carrier to perform the polishing of the substrate transferred by the substrate transfer unit.

The substrate cleaning line and system disclosed by Yun consist of a chamber portion that includes multiple cleaning chambers designed to clean a substrate. This innovative cleaning line features a first return robot that loads, unloads, or transfers the substrate to and from the cleaning chambers, which can be stacked vertically.

Career Highlights

Geun Sik Yun is currently employed at K. C. Tech Co., Ltd., where he applies his expertise in substrate processing technologies. His work has been instrumental in advancing the capabilities of substrate polishing and cleaning systems, making them more efficient and effective.

Collaborations

Yun collaborates with talented individuals in his field, including Hee Sung Chae and Seung Eun Lee. Their combined efforts contribute to the innovative projects at K. C. Tech Co., Ltd., enhancing the company's reputation in the industry.

Conclusion

Geun Sik Yun is a prominent inventor whose work in substrate polishing and cleaning technologies has made a significant impact. His patents reflect his commitment to innovation and excellence in the field.

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