Wilton, CT, United States of America

Gerth Elverskog

This inventor holds 2 USPTO granted patents. Top assignees: A.c.e. International, Other. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerth Elverskog. Retrieved from https://idiyas.com/inventor/gerth-elverskog

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 2

Forward Citations = 46(Granted Patents)


Company Filing History:


Years Active: 1992

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2 patents (USPTO):Explore Patents

Title: Gerth Elverskog: Innovator in Protective Gear

Introduction

Gerth Elverskog is an inventive mind based in Wilton, CT (US). He has made significant contributions to safety equipment, particularly for users of chain saws. With a total of 2 patents, his work focuses on enhancing user protection in hazardous environments.

Latest Patents

Elverskog's latest inventions include a protective jacket and protective chaps. The protective jacket is a sleeveless design that features padded front and shoulders. This padding is made from a material that jams a chain saw if it cuts into it, providing crucial protection to the user. The protective chaps are designed to be worn over trousers and are asymmetrical, specifically angled to cover the left side of the user's right leg, which is particularly vulnerable to injury.

Career Highlights

Throughout his career, Gerth Elverskog has worked with various companies, including A.C.E. International. His experience in the industry has allowed him to develop innovative solutions that prioritize user safety.

Collaborations

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Conclusion

Gerth Elverskog's contributions to protective gear demonstrate his commitment to safety and innovation. His inventions are vital for enhancing the safety of chain saw users, showcasing his role as a significant inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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