Gerd Pfeiffer

Title: Gerd Pfeiffer: Innovator in Semiconductor Technology

Introduction

Gerd Pfeiffer is a notable inventor based in Holzgerlingen, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the development of lift-off masks used in the production of conductor patterns.

Latest Patents

Pfeiffer holds a patent for the "Production of a lift-off mask and its application." This innovative process involves the use of a positive resist containing a weak base and polyvinyl phenol as a film-forming component. The resist is deposited on a substrate, exposed imagewise, cured, blanket exposed, and developed in a KOH solution at temperatures below 10°C. The resulting resist pattern is then exposed to light with a wavelength ranging from 300 to 320 nm and heat-treated at temperatures between 150°C and 280°C. The finished lift-off mask is dimensionally stable at temperatures up to 280°C and does not emit liquid or volatile components when heated. This technology is particularly beneficial for generating conductor patterns on semiconductor substrates, ensuring low and uniform contact resistances and high pattern accuracy.

Career Highlights

Gerd Pfeiffer is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Pfeiffer has collaborated with Holger Moritz, working together to enhance the development and application of semiconductor technologies.

Conclusion

Gerd Pfeiffer's innovative work in the field of semiconductor technology, particularly through his patent on lift-off masks, showcases his significant contributions to the industry. His collaboration with notable colleagues further emphasizes the importance of teamwork in advancing technological innovations.