Gerd Krause

Title: Gerd Krause: Innovator in Wafer Mark Configuration

Introduction

Gerd Krause is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of lithography, particularly in the production of DRAMs. His innovative work focuses on improving the alignment and determination of relative positions in substrates during lithographic exposure.

Latest Patents

Gerd Krause holds a patent for a mark configuration, wafer with at least one mark configuration, and a method of producing at least one mark configuration. This invention allows for a mark configuration that includes a mark structure and at least one layer of definable thickness underneath the mark structure. This design is crucial for adjusting the physical position of the mark structure relative to a reference plane in or on the substrate. The invention ensures that mark structures exhibit good contrast regardless of design or process conditions.

Career Highlights

Krause is associated with Infineon Technologies AG, where he has been instrumental in advancing technologies related to wafer production. His expertise in lithography and substrate alignment has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Gerd Krause has collaborated with notable colleagues such as Hans-Georg Fröhlich and Johannes Kowalewski. These collaborations have further enhanced the development of innovative solutions in the field.

Conclusion

Gerd Krause's contributions to wafer mark configuration and lithographic processes have made a significant impact on the technology used in DRAM production. His innovative spirit continues to drive advancements in the industry.