Eindhoven, Netherlands

Gerard Vermeulen

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerard Vermeulen. Retrieved from https://idiyas.com/inventor/gerard-vermeulen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Gerard Vermeulen and Reproduction-Mask Manufacturing

Introduction

Gerard Vermeulen is an inventor associated with Eindhoven, Netherlands. His recorded patent concerns a method for manufacturing reproduction masks used to produce shadow masks for display tubes.

Latest Patents

Vermeulen is credited with 1 patent: “Method of Manufacturing Reproduction Masks for Producing a Pattern of.” The invention describes making a pair of associated reproduction masks. To create elongated apertures that widen on the screen-facing side of a shadow mask, the second reproduction mask is produced from the first on a photographic plate. The method uses light rays with greater divergence perpendicular to the apertures’ long dimension than parallel to it.

Career Highlights

The available information associates Vermeulen with U.S. Philips Corporation. His patent reflects work on mask-manufacturing techniques for display tubes.

Collaborations

Vermeulen’s coworker is identified as Jan Van Der Waal. The supplied information does not specify further details about their collaboration.

Conclusion

Gerard Vermeulen’s recorded invention addresses a specialized reproduction-mask process intended to shape apertures in shadow masks for display tubes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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