Gerard Beal

Title: The Innovations of Gerard Beal

Introduction

Gerard Beal is a notable inventor based in Paris, France. He has made significant contributions to the field of technology, particularly in the development of methods for forming electrodes. With a total of two patents to his name, Beal's work showcases his expertise and innovative spirit.

Latest Patents

One of Gerard Beal's latest patents is a method of forming electrodes aligned with respect to an implantation level in a substrate. This invention provides a systematic approach to creating electrodes that are precisely aligned, which is crucial for enhancing the performance of electronic devices. Another significant patent is related to a transverse charge transfer filter. This filter consists of N MOS capacitors arranged on the same semiconductor substrate, with electrodes designed to optimize charge transfer efficiency. The innovative arrangement of the electrodes allows for compensation of the effects caused by mask displacements during manufacturing.

Career Highlights

Gerard Beal has built a successful career at Thomson-CSF, a prominent company in the technology sector. His work has not only advanced the company's objectives but has also contributed to the broader field of semiconductor technology. Beal's patents reflect his commitment to innovation and excellence in engineering.

Collaborations

Throughout his career, Gerard Beal has collaborated with esteemed colleagues such as Pierre Blanchard and Jean-Louis Coutures. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Gerard Beal's contributions to the field of technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations.