Huntsville, AL, United States of America

Gerald Tuck

This inventor holds 1 USPTO granted patent. Top assignee: Mems Optical, Inc.. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Gerald Tuck: Innovator in Photolithographic Processes

Introduction

Gerald Tuck is a notable inventor based in Huntsville, Alabama. He has made significant contributions to the field of photolithography, particularly through his innovative patent. His work has implications for various applications in the semiconductor industry.

Latest Patents

Gerald Tuck holds a patent for a "Modulated exposure mask and method of using a modulated exposure mask." This photolithographic process involves providing a layer of photoresistive material on a target substrate. Radiation is transmitted to the photoresistive material through a layer of absorbing material that absorbs the radiation with a transmittance proportional to the thickness of the absorbing material. A surface relief structure is formed in the absorbing material, allowing the photoresistive material to be partially exposed in a pattern corresponding to the surface relief structure. Consequently, when the photoresistive material is developed, it exhibits a surface relief structure that mirrors the one in the absorbing material. The developed photoresistive material and target substrate are then etched to create a surface relief structure in the target substrate that corresponds to the developed photoresistive material.

Career Highlights

Gerald Tuck is associated with Mems Optical, Inc., where he applies his expertise in photolithography. His innovative approach has led to advancements in the manufacturing processes used in the semiconductor industry. With a patent count of 1 patent, Tuck's contributions are recognized within his field.

Collaborations

Gerald has collaborated with notable colleagues, including David Renick Brown and Barry S McCoy. Their combined efforts have furthered the development of technologies in photolithography and related fields.

Conclusion

Gerald Tuck's work in photolithography exemplifies the innovative spirit of modern inventors. His patent and contributions to Mems Optical, Inc. highlight the importance of advancements in this critical area of technology.

Profile summary based on public USPTO records.
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