Coesfeld, Germany

Gerald Beermann

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fachhochschule Muenster. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerald Beermann. Retrieved from https://idiyas.com/inventor/gerald-beermann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Gerald Beermann: Innovator in Protective Layer Technology

Introduction

Gerald Beermann is a notable inventor based in Coesfeld, Germany. He has made significant contributions to the field of protective materials, particularly through his innovative patent that addresses impact stress protection.

Latest Patents

Gerald Beermann holds a patent for a workpiece comprising a laminate designed to protect against impact stress. The patent outlines a method for applying a protective layer, which involves mixing a sealing alloy in powder form with a binder and water to create a pasty compound. This compound is then applied to the surface that requires protection, dried, and heated to a temperature of at least 800°C.

Career Highlights

Throughout his career, Gerald has worked with esteemed institutions such as Fachhochschule Münster. His work has focused on developing advanced materials that enhance the durability and resilience of various applications.

Collaborations

Gerald has collaborated with professionals like Juergen Peterseim and Denis Knust, contributing to the advancement of protective technologies.

Conclusion

Gerald Beermann's innovative work in protective layer technology showcases his commitment to enhancing material resilience against impact stress. His contributions are valuable to the field and demonstrate the importance of innovation in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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