Montrouge, France

Georges Sayegh

This inventor holds 1 USPTO granted patent. Top assignee: Sciaky Bros., Inc.. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georges Sayegh. Retrieved from https://idiyas.com/inventor/georges-sayegh-bf0ak71e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Georges Sayegh

Introduction

Georges Sayegh is a notable inventor based in Montrouge, France. He has made significant contributions to the field of engineering, particularly in the area of electron beam machining. His innovative approach has led to the development of advanced technologies that enhance material processing in vacuum environments.

Latest Patents

One of Georges Sayegh's key patents is titled "Apparatus for Electron Beam Machining in Vacuum." This invention provides a sophisticated solution for working materials in a vacuum using an electron beam. The apparatus features a first chamber with a longitudinal gap that creates a vacuum-tight area around the machining line. It includes a flexible sealing strip to plug the gap and a second leakproof chamber that houses an electron gun. The design allows for the second chamber to be movable along the gap, optimizing the machining process.

Career Highlights

Georges Sayegh has been associated with Sciaky Bros., Inc., where he has applied his expertise in electron beam technology. His work has contributed to advancements in manufacturing processes, particularly in industries that require precision machining in controlled environments.

Conclusion

Georges Sayegh's innovative work in electron beam machining exemplifies the impact of inventive thinking on modern engineering. His contributions continue to influence the field and pave the way for future advancements in material processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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