Company Filing History:
Years Active: 1986-1988
Title: Innovations by George S Wooster
Introduction
George S Wooster is an accomplished inventor based in Hamburg, NY (US). He holds 2 patents that contribute significantly to the field of integrated circuits and materials science. His work has paved the way for advancements in semiconductor technology.
Latest Patents
One of his latest patents is focused on "Cyclosilazane polymers as dielectric films in integrated circuit." This patent presents an improved method for the deposition of dielectric films in the fabrication of integrated circuits (ICs). A solution of polymers derived from cyclosilazanes is employed to deposit dielectric films on semiconductor substrates using the spin-on technique. These spin-on films effectively planarize the underlying substrate topography, making them especially advantageous in multilevel metallization processes. This innovation allows for a highly uniform and continuous deposition of subsequent layers of metallization, resulting in improved yield and reliability of ICs.
Another notable patent is for a "Polymeric boron nitrogen dopant." In this patent, a polymeric borazole is produced by reacting BCl₃ and an amine at temperatures between -60°C and -5°C in an inert solvent. This reaction forms an intermediate triaminoborane, which is then further polymerized after the removal of the amine hydrochloride salt via thermal condensation at temperatures ranging from 380°C to 420°C. The resulting polymer, in the form of a glassy resin, showcases the potential of borazole polymers derived from the polymerization of specific monomers.
Career Highlights
George S Wooster has made significant contributions to the field of materials science and semiconductor technology. His innovative approaches have led to advancements that enhance the performance and reliability of integrated circuits. His work is recognized for its practical applications in the industry.
Collaborations
Throughout his career, George has collaborated with notable professionals in the field, including Stephen W Kirtley and Louis G Anello. These collaborations have further enriched his research and development efforts.
Conclusion
George S Wooster's contributions to the field of integrated circuits and materials science are noteworthy. His patents reflect a commitment to innovation and excellence in technology. His work continues to influence advancements in semiconductor fabrication processes.