Dover, MA, United States of America

George Liu

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sick Inc.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: George Liu. Retrieved from https://idiyas.com/inventor/george-liu-r8snnrfv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: George Liu - Innovator in Measurement Technology

Introduction

George Liu is an accomplished inventor based in Dover, MA (US). He has made significant contributions to the field of measurement technology. His innovative approach has led to the development of a unique patent that enhances the accuracy of measuring dimensions of target objects.

Latest Patents

George Liu holds a patent for a "Method and system for measuring dimensions of a target object." This invention relates to a method that comprises a systematic approach to accurately measure the dimensions of various target objects. His work in this area showcases his commitment to advancing measurement techniques.

Career Highlights

George Liu is currently associated with Sick Inc., a company known for its expertise in sensor technology and automation solutions. His role at Sick Inc. allows him to apply his innovative ideas in a practical setting, contributing to the company's mission of providing high-quality measurement solutions.

Collaborations

George has collaborated with notable coworkers, including Alexander Shteinfeld and Richard Lydon. Their combined expertise fosters a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

George Liu's contributions to measurement technology through his patent and work at Sick Inc. highlight his role as a significant innovator in the field. His dedication to improving measurement methods continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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