Lindenwold, NJ, United States of America

George Lalka

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: George Lalka. Retrieved from https://idiyas.com/inventor/george-lalka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: George Lalka: Innovator in Photopolymer Technology

Introduction

George Lalka is a notable inventor based in Lindenwold, NJ (US). He has made significant contributions to the field of photopolymer technology. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

George Lalka holds a patent for "Red sensitive photopolymerizable compositions." This patent discloses photopolymerizable compositions that comprise a borate anion, a squarylium sensitizer, and, in the preferred case, a halomethyl triazine. This invention represents a significant advancement in the field of photopolymer materials.

Career Highlights

Lalka is currently employed at E.I. du Pont de Nemours and Company, a leading organization in the chemical industry. His role at the company allows him to further explore and develop innovative solutions in photopolymer technology.

Collaborations

Throughout his career, George has collaborated with talented individuals such as William K. Smothers and Gregory Charles Weed. These collaborations have contributed to the advancement of his research and the successful development of his patent.

Conclusion

George Lalka's contributions to photopolymer technology through his innovative patent highlight his role as a significant inventor in the field. His work continues to influence advancements in photopolymer materials and applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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