Company Filing History:
Years Active: 2006
Title: Innovations by George James Lobos in Photolithography
Introduction
George James Lobos is an accomplished inventor based in Chetek, WI (US). She has made significant contributions to the field of semiconductor technology, particularly through her innovative patent related to photolithography and plasma etching.
Latest Patents
Lobos holds a patent for a process to form fine features using photolithography and plasma etching. This method involves creating sharp pointed structures in semiconductors. The process begins with providing a substrate and depositing an oxide layer, such as silicon oxide or silicon nitride, on the substrate. A low contrast photoresist is then applied to the oxide layer and exposed to optical energy through a reticle that has a partially triangular shape. After developing the low contrast photoresist, the oxide layer is etched to form the sharp pointed structure. Additionally, a film, such as a magnetoresistive layer, is deposited between the substrate and the oxide layer. The low contrast photoresist is subsequently removed, and the film is etched to create a sharp pointed film structure.
Career Highlights
Lobos is currently associated with Union Semiconductor Technology Corporation, where she continues to advance her research and development efforts in semiconductor technologies. Her work has been instrumental in enhancing the precision and efficiency of semiconductor manufacturing processes.
Collaborations
Lobos collaborates with her coworker, Hans Peter Mikelson, to further explore innovative solutions in the semiconductor industry.
Conclusion
George James Lobos is a notable inventor whose work in photolithography and plasma etching has paved the way for advancements in semiconductor technology. Her contributions are vital to the ongoing evolution of this field.