Palling, Germany

Georg Schroll

This inventor holds 1 USPTO granted patent. Top assignee: Skw Trostberg Aktiengesellschaft. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georg Schroll. Retrieved from https://idiyas.com/inventor/georg-schroll-yk791xkz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Georg Schroll: Innovator in Silicon Nitride Production

Introduction

Georg Schroll is a notable inventor based in Palling, Germany. He has made significant contributions to the field of materials science, particularly in the production of silicon nitride. His innovative approach has led to advancements that benefit various industrial applications.

Latest Patents

Georg Schroll holds a patent for a process for the production of silicon nitride. This process involves the reaction of silicon and nitrogen, where silicon powder is reacted with nitrogen that continuously rotates at temperatures ranging from 1000°C to 1800°C and at pressures between 1.01 to 1.8 bar. The resulting silicon nitride is produced in a porous form and possesses unique properties that enhance its usability in different applications. He has 1 patent to his name.

Career Highlights

Throughout his career, Georg Schroll has been associated with Skw Trostberg Aktiengesellschaft, where he has contributed to various research and development projects. His work has been instrumental in advancing the understanding and production of silicon-based materials.

Collaborations

Georg has collaborated with esteemed colleagues such as Ernst Graf and Jochen Hintermayer. Their combined expertise has fostered a productive environment for innovation and development in their field.

Conclusion

Georg Schroll's contributions to the production of silicon nitride exemplify the impact of innovative thinking in materials science. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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