DE

Georg Schroll

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georg Schroll. Retrieved from https://idiyas.com/inventor/georg-schroll-lmf44jj8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

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Title: Georg Schroll: Innovator in Silicon Nitride Production

Introduction

Georg Schroll is a notable inventor from Germany, recognized for his contributions to the field of materials science. His innovative work primarily focuses on the production of silicon nitride, a compound with significant applications in various industries.

Latest Patents

Georg Schroll holds a patent for the "Production Of Silicon Nitride And The Product Thereby Obtained." This patent describes a process for producing silicon nitride through the reaction of silicon and nitrogen. The method involves reacting silicon powder with nitrogen at temperatures ranging from 1000 to 1800°C and pressures between 1.01 to 1.8 bar. The resulting silicon nitride is characterized by its porous form, with specific properties including a grain size of 0.1 to 20 mm, a nitrogen content of 1 to 39.5% by weight, an oxygen content of less than 1%, and a ratio of α-phase to β-phase ranging from 1:9 to 9:1.

Career Highlights

Throughout his career, Georg Schroll has worked with various companies, including Jochen Hintermayer and Ernst Graf GmbH. His experience in these organizations has contributed to his expertise in the production of advanced materials.

Collaborations

One of his notable collaborators is Ernst Graf, with whom he has worked closely in the field of silicon nitride production.

Conclusion

Georg Schroll's innovative approach to the production of silicon nitride has made a significant impact in materials science. His contributions continue to influence the development of advanced materials for various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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