Alberswil, Switzerland

Georg Häusler

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Omya International Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georg Häusler. Retrieved from https://idiyas.com/inventor/georg-hausler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Georg Häusler: Innovator in Digital Print Medium Coatings

Introduction

Georg Häusler is a notable inventor based in Alberswil, Switzerland. He has made significant contributions to the field of digital printing through his innovative patent. His work focuses on enhancing the quality and efficiency of print media.

Latest Patents

Häusler holds a patent for a coating formulation specifically designed for digital print mediums. This invention relates to a cationic coating formulation that includes water, anionic ultrafine ground calcium carbonate, non-ionic polyvinyl alcohol, a water-soluble salt of a divalent metal ion, a dispersing agent, and a cationic polymer. This formulation is particularly useful in the manufacturing of inkjet print mediums.

Career Highlights

Georg Häusler is associated with Omya International AG, a company known for its expertise in mineral-based products. His role at the company has allowed him to focus on developing innovative solutions for the printing industry.

Collaborations

Häusler collaborates with Jan Philipp Weihs, contributing to advancements in their field through shared expertise and innovative ideas.

Conclusion

Georg Häusler's contributions to the digital printing industry through his patented coating formulation exemplify the impact of innovation in enhancing print media quality. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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