Geoffrey H Humberstone

Title: The Innovative Contributions of Geoffrey H. Humberstone

Introduction

Geoffrey H. Humberstone is a notable inventor based in Holland, MI (US), recognized for his significant contributions to the field of sputtering technology. With a total of three patents to his name, Humberstone has made advancements that enhance the efficiency and functionality of sputtering apparatuses.

Latest Patents

Humberstone's latest patents include a "Linear planar-magnetron sputtering apparatus with reciprocating" and a "Cantilever mount for rotating cylindrical magnetrons." The linear planar-magnetron sputtering apparatus features a cathode body that encloses a magnet array, which can be moved reciprocally. This design allows for improved cooling through the target-supporting member and the walls of the cathode body. The cantilever mount for rotating cylindrical magnetrons provides a unique solution for rotatably mounting a cylindrical magnetron in a vacuum chamber, ensuring that the load of the magnetron does not affect the vacuum seal.

Career Highlights

Throughout his career, Humberstone has worked with several companies, including Viratec Thin Films, Inc. and Photran Corporation. His experience in these organizations has contributed to his expertise in the development of advanced sputtering technologies.

Collaborations

Humberstone has collaborated with notable colleagues such as David E. Stevenson and Erik J. Bjornard, further enhancing his innovative work in the field.

Conclusion

Geoffrey H. Humberstone's contributions to sputtering technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.