Location History:
- Osaka, JP (2012)
- Tokyo, JP (2015)
Company Filing History:
Years Active: 2012-2015
Title: Genshu Fuse: Innovator in Semiconductor Manufacturing
Introduction
Genshu Fuse is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His innovative approaches have paved the way for advancements in semiconductor device technology.
Latest Patents
Genshu Fuse's latest patents focus on manufacturing methods for semiconductor devices. The first patent describes a method that involves the formation of a silicon Fin part on a silicon substrate. A thin film containing impurity atoms is formed, allowing for a greater thickness on the upper flat portion compared to the side wall portions. This method includes diagonal ion implantations that facilitate the recoiling of impurity atoms, enhancing the semiconductor's properties.
The second patent also outlines a manufacturing method for semiconductor devices. It involves preparing a semiconductor substrate with a concavity and convexity on its surface. An impurity thin film is deposited, followed by diagonal ion implantation. This process allows for the effective recoiling of impurity atoms into the concavity and convexity parts, improving the overall functionality of the semiconductor device.
Career Highlights
Genshu Fuse is associated with Sen Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in developing advanced manufacturing techniques that are crucial for modern electronics.
Collaborations
Genshu collaborates with Michiro Sugitani, a fellow innovator in the field. Their partnership has led to the exploration of new ideas and methodologies in semiconductor manufacturing.
Conclusion
Genshu Fuse's contributions to semiconductor manufacturing highlight his role as a key inventor in the industry. His patents reflect a deep understanding of the complexities involved in semiconductor technology, and his work continues to influence advancements in this critical field.