This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: National Taiwan University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Geng-Sheng Lin: Innovator in Porous Membrane Fabrication
Introduction
Geng-Sheng Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the fabrication of porous membranes. His innovative methods have the potential to impact various applications in filtration and separation technologies.
Latest Patents
Geng-Sheng Lin holds a patent for "Methods of fabricating porous membrane." This patent outlines two distinct methods for creating porous membranes. The first method involves growing a mesoporous silica thin film with perpendicular mesopore channels on a polymer film, which is then transferred onto a macroporous substrate. After the polymer film is removed, a porous membrane is formed. The second method also begins with a polymer film on a macroporous substrate, which includes crosslinked polymers. A mesoporous silica thin film is then grown on this polymer film, and upon removal of the polymer, a porous membrane is created.
Career Highlights
Geng-Sheng Lin is affiliated with National Taiwan University, where he conducts research and development in materials science. His work has garnered attention for its innovative approaches to membrane technology. He has successfully developed methods that enhance the efficiency and effectiveness of porous membranes.
Collaborations
Geng-Sheng Lin has collaborated with notable colleagues such as Kuo-Lun Tung and Jingling Yang. These collaborations have contributed to the advancement of research in the field of porous materials.
Conclusion
Geng-Sheng Lin is a prominent figure in the innovation of porous membrane fabrication. His patented methods represent a significant advancement in materials science, showcasing his dedication to research and development. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
