Company Filing History:
Years Active: 2019
Title: Geng-I Lin: Innovator in Polishing Technology
Introduction
Geng-I Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent.
Latest Patents
Geng-I Lin holds a patent for a base layer, polishing pad with a base layer, and polishing method. This invention provides a polishing pad that includes a polishing layer and a base layer. The base layer, situated beneath the polishing layer, is designed as a three-dimensional fabric. This fabric consists of a top woven layer, a bottom woven layer, and a supporting woven layer positioned between the top and bottom layers. The top and bottom woven layers are crafted from a plurality of first and second sets of yarns, respectively. The supporting woven layer features multiple supporting yarns that interconnect the top and bottom woven layers, creating a space between them.
Career Highlights
Geng-I Lin is associated with Iv Technologies Co., Ltd., where he continues to develop and refine his innovative ideas. His work has garnered attention for its practical applications in the polishing industry.
Collaborations
Some of his notable coworkers include Yu-Hao Pan and Kun-Che Pai, who contribute to the collaborative environment at Iv Technologies Co., Ltd.
Conclusion
Geng-I Lin's contributions to polishing technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the industry and inspire future developments.