Gene Mirro

Title: Gene Mirro: Innovator in Charged Particle Beam Technology

Introduction

Gene Mirro is a notable inventor based in Kalama, WA (US). He has made significant contributions to the field of charged particle beam technology, holding 2 patents that showcase his innovative approach to improving FIB patterning.

Latest Patents

One of Gene Mirro's latest patents is focused on pattern modification schemes for improved FIB patterning. This invention presents an enhanced method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system. By altering one or more of the deflector signals, the method aims to reduce or eliminate over-shoot effects that can result from time-of-flight (TOF) errors. In one embodiment, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion, which helps mitigate these over-shoot effects. Additionally, other embodiments may utilize analog filters or signal amplifiers with a lower bandwidth to further address TOF errors. Through these modifications, the scan pattern can be adjusted to significantly reduce or eliminate over-shoot effects.

Career Highlights

Gene Mirro is currently associated with FEI Company, where he continues to develop and refine technologies related to charged particle beams. His work has been instrumental in advancing the capabilities of FIB systems, making them more efficient and effective for various applications.

Collaborations

Gene has collaborated with several talented individuals in his field, including Tom Miller and Cornelis Sander Kooijman. These partnerships have contributed to the innovative advancements in the technologies he has developed.

Conclusion

Gene Mirro's contributions to charged particle beam technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in FIB patterning and related technologies.