This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1978.
Company Filing History:
Years Active: 1978
Title: Gene A Silvey: Innovator in Silicon Nitride Film Technology
Introduction
Gene A Silvey is a notable inventor based in Elizaville, NY (US). He has made significant contributions to the field of materials science, particularly in the deposition of silicon nitride films. His innovative work has led to the development of a patented method that enhances the quality and efficiency of silicon nitride film production.
Latest Patents
Gene A Silvey holds a patent for a method of depositing continuous pinhole-free silicon nitride films. This patent describes a substrate article coated with a pinhole-free film of silicon nitride, produced by reacting silane with a nitrogen-containing compound. The process involves the decomposition of the compound to produce nascent nitrogen and sufficient amounts of a carrier gas that is inert to the reactants. The substrate is then heated to a temperature above about 500°C to facilitate the deposition of the silicon nitride film.
Career Highlights
Gene A Silvey is associated with the International Business Machines Corporation (IBM), where he has contributed to various research and development projects. His work at IBM has positioned him as a key player in advancing technologies related to semiconductor materials and coatings.
Collaborations
Throughout his career, Gene has collaborated with esteemed colleagues, including Ven Y Doo and Donald R Nichols. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the field.
Conclusion
Gene A Silvey's contributions to the field of silicon nitride film technology exemplify his dedication to innovation and excellence. His patented methods continue to influence advancements in materials science, showcasing the importance of his work in the industry.