Toyama, Japan

Gen Shikida

This inventor holds 1 USPTO granted patent and 3 published patent applications and 1 EPO patent. Top assignee: Kokusai Electric Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gen Shikida. Retrieved from https://idiyas.com/inventor/gen-shikida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Gen Shikida: Innovator in Semiconductor Technology

Introduction

Gen Shikida is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances substrate processing.

Latest Patents

Gen Shikida holds a patent for a substrate processing apparatus, method of manufacturing semiconductor devices, and a recording medium. This invention includes a substrate holder with a substrate mounting table, a substrate transferrer for loading and unloading substrates, a process container for accommodating the substrate holder, a film-forming gas supply system, and a controller for managing the film-forming process. The technology allows for the interruption of the film forming process to ensure that a film of the desired thickness is achieved on the substrate.

Career Highlights

Gen Shikida is currently employed at Kokusai Electric Corporation, where he continues to innovate in semiconductor manufacturing processes. His work has been instrumental in advancing the efficiency and effectiveness of substrate processing techniques.

Collaborations

He collaborates with esteemed colleagues such as Jin Shibata and Ichiro Nunomura, contributing to a dynamic team focused on technological advancements in the semiconductor industry.

Conclusion

Gen Shikida's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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