Company Filing History:
3 out of 2,916 
1 out of 52,751 
Years Active: 1983-1985
Title: Gen Sasaki: Innovator in Semiconductor Technology
Introduction
Gen Sasaki is a prominent inventor based in Yokohama, Japan, known for his contributions to semiconductor technology. With a total of 4 patents to his name, he has made significant advancements in methods for manufacturing semiconductor devices.
Latest Patents
Sasaki's latest patents include a "Method of selectively etching high impurity concentration semiconductor" and a "Method for manufacturing semiconductor device." The first patent discloses a technique for selectively etching a high impurity concentration semiconductor layer by utilizing a difference in impurity concentration. This method involves exposing the semiconductor layer to an aqueous solution of a hydrogen fluoride-nitric acid-acetic acid-based etching solution while applying ultrasonic vibration. The second patent outlines a comprehensive method for manufacturing a semiconductor device, which includes forming grooves in a semiconductor substrate, selectively depositing masking materials, and introducing impurities to create isolation regions with high precision.
Career Highlights
Throughout his career, Gen Sasaki has worked with notable companies such as Tokyo Shibaura Denki and Toshiba Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Sasaki has collaborated with esteemed colleagues, including Minoru Taguchi and Shuichi Kameyama, further enhancing his work in the field of semiconductor manufacturing.
Conclusion
Gen Sasaki's innovative methods and patents have significantly impacted the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.