Kyungki-do, South Korea

Gee-Hoo Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gee-Hoo Kim. Retrieved from https://idiyas.com/inventor/gee-hoo-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovations of Gee-Hoo Kim

Introduction

Gee-Hoo Kim is a notable inventor based in Kyungki-do, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique mask pattern for semiconductor devices.

Latest Patents

Gee-Hoo Kim holds 1 patent for a mask pattern of a semiconductor device and a method of manufacturing. This patent provides a mask pattern for manufacturing a resist pattern of a semiconductor device through photolithography. The additional mask pattern is designed so that resist patterns are not formed after exposure in the spaces thereof. This innovative approach enables the formation of specific patterns with improved profiles, enhancing the manufacturing process of fine patterns.

Career Highlights

Gee-Hoo Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to contribute to cutting-edge technologies in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Dong-Seon Lee and Woo-Sung Han. Their collaboration has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Gee-Hoo Kim's contributions to semiconductor technology exemplify the importance of innovation in the electronics industry. His patent reflects a significant advancement in manufacturing techniques, showcasing his role as a key inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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