This inventor holds 2 USPTO granted patents. Top assignee: The Ohio State University. Active years: 1996.
Company Filing History:
Years Active: 1996
Title: Ge Wang: Innovator in Diffusion Coating Technologies
Introduction
Ge Wang is a prominent inventor based in Columbus, OH (US). He has made significant contributions to the field of materials science, particularly in the area of diffusion coatings. With a total of 2 patents to his name, Wang's work has implications for various industrial applications.
Latest Patents
Wang's latest patents focus on a method of depositing chromium and silicon on a metal to form a diffusion coating. This innovative method utilizes a halide-activated cementation pack with a dual halide activator. Elemental metal powders can be employed with the dual activator, enhancing the effectiveness of the coating process. A two-step heating schedule is implemented to prevent the formation of chromium carbide at the surface of the workpiece. Additionally, small amounts of either cerium (Ce) or vanadium (V) can be incorporated into the chromium and silicon contents of the coating by introducing their oxides into the filler of the pack.
Career Highlights
Ge Wang is affiliated with The Ohio State University, where he continues to advance research in materials science. His work has garnered attention for its innovative approaches to coating technologies, which are essential for improving the durability and performance of various metal components.
Collaborations
Wang has collaborated with notable colleagues, including Robert A. Rapp and Endang Pangestuti. These partnerships have contributed to the development of his patented technologies and have fostered a collaborative research environment.
Conclusion
Ge Wang's contributions to the field of diffusion coatings exemplify the importance of innovation in materials science. His patents reflect a commitment to advancing technology that can enhance industrial applications.