Santa Clara, CA, United States of America

Gautham Bammanahalli

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gautham Bammanahalli. Retrieved from https://idiyas.com/inventor/gautham-bammanahalli-bs98w94f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Gautham Bammanahalli: Innovator in Electrostatic Chuck Technology

Introduction

Gautham Bammanahalli is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of electrostatic chuck technology, particularly with his innovative approaches to substrate handling.

Latest Patents

Gautham holds a patent for a "Soft-chucking scheme for improved backside particle performance." This patent outlines methods for chucking and de-chucking a substrate, which includes applying a first voltage to a chucking electrode during a chucking time interval. It also involves supplying an inert gas at a first pressure to the backside of the substrate during this interval, followed by applying a higher second voltage and increasing the inert gas pressure after the chucking time interval.

Career Highlights

Gautham is currently employed at Applied Materials, Inc., where he continues to develop and refine technologies that enhance substrate performance in various applications. His work has been instrumental in advancing the capabilities of electrostatic chucks.

Collaborations

Gautham collaborates with talented professionals such as Tony Jefferson Gnanaprakasa and Alvaro Garcia, contributing to a dynamic team focused on innovation and excellence in their field.

Conclusion

Gautham Bammanahalli's contributions to electrostatic chuck technology exemplify his commitment to innovation and improvement in substrate handling processes. His patent and ongoing work at Applied Materials, Inc. highlight his role as a key figure in this technological domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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