Location History:
- Half Moon Bay, CA (US) (1996 - 2006)
- San Gregorio, CA (US) (2007 - 2010)
Company Filing History:
Years Active: 1996-2010
Title: Innovations and Contributions of Gary W. Ferrell
Introduction
Gary W. Ferrell is a notable inventor based in Half Moon Bay, California. He holds a total of 16 patents, showcasing his significant contributions to the field of technology and innovation. His work primarily focuses on systems and methods that enhance particle removal through advanced cavitation techniques.
Latest Patents
One of his latest patents is titled "Uniform Cavitation for Particle Removal." This invention involves systems and methods for promoting a substantially uniform cavitation field. The system includes a diaphragm that divides a container, producing a second energy pulse corresponding to the first energy pulse arising from the collapse of a cavity. This innovation is designed to determine whether to adjust a corresponding transducer. Additionally, the system features a cavity-creating unit that is moveable from a test liquid to a particle removal liquid after transducer testing. Another significant patent is the "Wafer Dryer and Method for Drying a Wafer." This invention utilizes a nebulizer that emits a pressurized drying liquid stream, which converges with a non-reactive carrier gas stream to create a drying liquid fog. This fog adheres to exposed wafer surfaces, effectively displacing remaining liquid and drying the wafer.
Career Highlights
Throughout his career, Gary W. Ferrell has worked with various companies, including Sez America, Inc. His innovative approaches and technical expertise have made a lasting impact in the industry.
Collaborations
Gary has collaborated with notable individuals such as Thomas D. Spencer and John F. Schipper, contributing to the advancement of technology through teamwork and shared expertise.
Conclusion
Gary W. Ferrell's contributions to the field of innovation are evident through his numerous patents and collaborative efforts. His work continues to influence advancements in technology and particle removal systems.