The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 1999

Filed:

Jun. 20, 1997
Applicant:
Inventor:

Gary W Ferrell, Half Moon Bay, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134-13 ; 134184 ; 134201 ; 134902 ;
Abstract

Method and apparatus for processing a workpiece in a chemical bath liquid contained in a liquid container. The liquid container is fabricated from a material such as polyetheretherketone (PEEK), poly-amide-imide (PAI) or polyphenylene sulfide (PPS). A vibration generator is positioned on each of one or more container walls to introduce vibrations with a selected frequency (20-750 kHz) through the container wall(s) and into the chemical bath liquid. Two or more vibration generators may introduce vibrations with different frequencies into the chemical bath liquid and at different angles. The chemical bath liquid may be an acid such as HCl, H.sub.2 SO.sub.4, HNO.sub.3, H.sub.2 PO.sub.3 and HF, or may be an oxidizer or base such as NH.sub.4 OH and H.sub.2 O.sub.2. The chemical bath may be used to process semiconductor wafers and circuits, printed circuit boards, optical components and similar workpieces.


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