Gloucester, NJ, United States of America

Gary K Stout

This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1990-1993.


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Gloucester, NJ (US) (1990)
  • Gloucester City, NJ (US) (1993)

Company Filing History:


Years Active: 1990-1993

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2 patents (USPTO):Explore Patents

Title: Gary K. Stout: Innovator in Photopolymer Technology

Introduction

Gary K. Stout is a notable inventor based in Gloucester, NJ (US), recognized for his contributions to the field of photopolymer technology. With a total of 2 patents, Stout has made significant advancements in the application of solder mask layers in printed circuit substrates.

Latest Patents

Stout's latest patents include a process for the lamination of a photopolymerizable solder mask layer to a substrate. This innovative process involves applying a preformed photopolymerizable solder mask film and a photosensitive liquid to a printed circuit substrate containing multiple holes. The method aims to reduce failures in photopolymerized areas of the solder mask film above the holes after soldering operations. The photosensitive liquid comprises at least one ethylenically unsaturated compound capable of forming a high polymer through addition polymerization, along with a first photoinitiator system with a specific absorption maximum. The preformed photopolymerizable film also contains similar compounds and a second photoinitiator system, ensuring effective activation by actinic radiation.

Another significant patent by Stout is the method for achieving a void-free interface between a photosensitive dry film and substrate. This method involves applying uniform fluid pressure after vacuum lamination, which enhances the quality and reliability of the solder mask coating on printed circuits.

Career Highlights

Gary K. Stout is currently employed at E.I. du Pont de Nemours and Company, where he continues to innovate in the field of photopolymer technology. His work has contributed to advancements in manufacturing processes that enhance the reliability of electronic components.

Collaborations

Stout has collaborated with Robert W. Ashcraft, furthering the development of technologies in their field. Their partnership has led to significant improvements in the application of photopolymer materials.

Conclusion

Gary K. Stout's contributions to photopolymer technology and his innovative patents have made a lasting impact on the industry. His work continues to influence the development of reliable electronic components, showcasing the importance of innovation in technology.

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