This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Gary How - Innovator in Metal Deposition Technologies
Introduction
Gary How is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technologies. His innovative work focuses on methods for depositing metal silicides on substrates, which are crucial in various semiconductor applications.
Latest Patents
Gary How holds a patent for a "Method of selective metal deposition using separated reactant activation and plasma discharging zone." This patent describes methods of depositing a metal silicide on a substrate. In this method, a plasma is created in a CVD chamber, where a first gas flows through openings in a showerhead to an activation region. A second gas, containing a metal precursor, is also introduced to activate the deposition process. This innovative approach enhances the efficiency and effectiveness of metal deposition on silicon-containing surfaces.
Career Highlights
Gary How is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. His work at Applied Materials has allowed him to contribute to advancements in deposition technologies that are essential for modern electronics.
Collaborations
Gary has collaborated with talented coworkers, including Xianmin Tang and Yiyang Wan. Their combined expertise has fostered an environment of innovation and progress in their field.
Conclusion
Gary How's contributions to metal deposition technologies exemplify the spirit of innovation in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a key inventor in advancing these critical technologies.