This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Gary How - Innovator in Semiconductor Technology
Introduction
Gary How is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for forming contact structures on semiconductor substrates.
Latest Patents
Gary How holds 1 patent for his invention titled "Method of forming a MEOL contact structure." This patent describes a method that includes treating a native oxide layer formed on a contact junction. The process involves creating a silica salt layer on the contact junction, which is then exposed to a plasma comprising oxygen. This exposure results in the formation of a silicon oxynitride material on the surfaces involved. The method further includes selectively forming a metal silicide layer on the contact junction and filling the contact feature with a metal layer.
Career Highlights
Gary How is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that enhance semiconductor manufacturing processes. His expertise in this area has positioned him as a valuable asset to his team and the industry.
Collaborations
Gary has collaborated with talented individuals such as Chih-Hsun Hsu and Yiyang Wan. These collaborations have contributed to the successful development of innovative solutions in semiconductor technology.
Conclusion
In summary, Gary How is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His patent for a method of forming a MEOL contact structure showcases his innovative thinking and dedication to improving manufacturing processes.