Gary H Cheung is a notable inventor based in Fremont, CA, who has made significant contributions to the field of microelectronics. With a total of 4 patents to his name, Cheung has developed innovative technologies that enhance the design and functionality of integrated circuits.

Latest Patents

One of his latest patents is titled "Low profile variable width input/output cells." This invention presents an apparatus and method for input/output (I/O) design, utilizing a predetermined relationship that allocates the outer ring area of an integrated circuit die for I/O circuits contained in I/O cells. The height of the I/O cell is reduced from prior art cell heights, while the width is varied based on the circuit's specific needs. For complex circuits requiring high drive strength, a wider cell is assigned, whereas simpler circuits receive a narrower cell. Each I/O cell is associated with a bonding pad placed directly below its starting point, and the height of the cells can be adjusted on each side of the chip to accommodate more I/O cells along the edges.

Another significant patent by Cheung is for a "Microelectronic circuit including silicided field-effect transistor." This invention involves field-effect transistors formed on a substrate with silicided elements, including diffusion regions and polysilicon gates. The silicided surfaces provide low ohmic resistance, facilitating interconnections between spaced contacts and freeing routing areas for other interconnections. The diffusion regions of adjacent transistors are designed with indentations that form part of a substrate tap area. The low ohmic resistance allows for the substrate tap area to be cut out without degrading the electrical performance of the transistors, significantly reducing the space required for transistors on the substrate.

Career Highlights

Gary H Cheung is currently employed at LSI Logic Corporation, where he continues to innovate in the field of microelectronics. His work has had a profound impact on the design and efficiency of integrated circuits.

Collaborations

Throughout his career, Cheung has collaborated with talented individuals such as Trung T Nguyen and Elias Lozano, contributing to the advancement of technology in his field.

Conclusion

Gary H Cheung's contributions to microelectronics through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the design of integrated circuits, showcasing the importance of innovation in this rapidly evolving field

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