Gary Devries

Title: Gary Devries: Innovator in Metrology Systems

Introduction

Gary Devries is a notable inventor based in Penfield, NY (US). He has made significant contributions to the field of metrology, particularly in the measurement of aspheric test objects. His innovative approach has led to the development of a unique patent that enhances measurement accuracy.

Latest Patents

Gary Devries holds a patent for "Stitching of near-nulled subaperture measurements." This patent describes a metrology system designed for measuring aspheric test objects through subaperture stitching. The system utilizes a wavefront-measuring gauge with a limited capture range of wavefront shapes. It collects partially overlapping subaperture measurements over the test object. A variable optical aberrator is employed to reshape the measurement wavefront, ensuring it remains within the capture range of the gauge. Additionally, various error compensators are integrated into the stitching operation to manage residual errors associated with the use of the variable optical aberrator.

Career Highlights

Gary Devries is currently associated with QED Technologies International, Inc., where he applies his expertise in metrology systems. His work has been instrumental in advancing the technology used for precise measurements in optical engineering.

Collaborations

Some of his notable coworkers include Paul Murphy and Christopher Brophy, who contribute to the innovative environment at QED Technologies International, Inc.

Conclusion

Gary Devries is a distinguished inventor whose work in metrology systems has paved the way for advancements in the measurement of aspheric test objects. His contributions continue to influence the field positively.