The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Apr. 08, 2009
Paul Murphy, Rochester, NY (US);
Gary Devries, Penfield, NY (US);
Christopher Brophy, Pittsford, NY (US);
Greg Forbes, North Epping Sydney, AU;
Paul Murphy, Rochester, NY (US);
Gary Devries, Penfield, NY (US);
Christopher Brophy, Pittsford, NY (US);
Greg Forbes, North Epping Sydney, AU;
QED Technologies International, Inc., Aurora, IL (US);
Abstract
A metrology system for measuring aspheric test objects by subaperture stitching. A wavefront-measuring gauge having a limited capture range of wavefront shapes collects partially overlapping subaperture measurements over the test object. A variable optical aberrator reshapes the measurement wavefront with between a limited number of the measurements to maintain the measurement wavefront within the capture range of the wavefront-measuring gauge. Various error compensators are incorporated into a stitching operation to manage residual errors associated with the use of the variable optical aberrator.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile