This inventor holds 3 USPTO granted patents. Top assignees: Applied Materials, Inc., The University of New Mexico. Active years: 1997-2001.
Company Filing History:
Years Active: 1997-2001
Title: Gary D. Tipton: Innovator in Substrate Reactant Homogenization
Introduction
Gary D. Tipton is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of substrate reactant homogenization, holding a total of 3 patents. His work focuses on improving the uniformity of reactant concentrations over substrates, which is crucial for various applications in semiconductor manufacturing.
Latest Patents
One of Gary D. Tipton's latest inventions is the near substrate reactant homogenization apparatus. This innovative apparatus reduces the excess reactive species in a region at or near the edge of a substrate surface. By providing a uniform reactant concentration over the substrate, it enhances etch rate uniformity. The apparatus features a substantially planar surface that is parallel to the substrate surface and extends beyond the substrate edge. In one preferred embodiment, the temperature of the gas absorber area is adjusted to promote the recombination or condensation of excess reactive species at the substrate edge. Another embodiment utilizes a porous material with a large surface area to capture excess reactive species, allowing for their recombination. Additionally, a gas curtain of a laminar inert or reactive gas can be employed along the substrate surface perimeter to form a diffusive barrier that suppresses the flux of excess reactive species.
Career Highlights
Throughout his career, Gary D. Tipton has worked with prominent organizations such as Applied Materials, Inc. and the University of New Mexico. His experience in these institutions has allowed him to develop and refine his innovative ideas in the field of substrate technology.
Collaborations
Gary has collaborated with notable colleagues, including Robert B. Campbell and Robert L. Jarecki, Jr. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Gary D. Tipton is a distinguished inventor whose work in substrate reactant homogenization has made a significant impact in the field. His innovative patents and collaborations reflect his commitment to advancing technology in semiconductor manufacturing.