This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1999-2007.
Location History:
- Berkeley, CA (US) (1999)
- San Jose, CA (US) (2003)
- San Francisco, CA (US) (2007)
Company Filing History:
Years Active: 1999-2007
Title: Innovations of Gary C Hsueh in Semiconductor Processing
Introduction
Gary C Hsueh is a notable inventor based in San Jose, CA, who has made significant contributions to the field of semiconductor processing. He holds a total of 3 patents that focus on improving the efficiency and effectiveness of various etching processes in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Method and apparatus employing integrated metrology for improved dielectric etch efficiency." This invention provides a method and apparatus for processing semiconductor wafers, aimed at reducing dimensional variation. The process involves feeding forward information related to photoresist mask critical dimension (CD) and profile, as well as underlying layer thickness, to adjust subsequent processing steps. This feedback mechanism enhances the precision of the etch process, ultimately improving yield by minimizing contamination risks.
Another significant patent by Hsueh is the "Method for etching low k dielectrics." This method focuses on plasma etching of low k materials, particularly those that are polymeric-based. The invention utilizes an etchant plasma generated from halogens other than fluorine and oxygen, with chlorine being the preferred choice. The method ensures advantageous etch selectivity for low k materials over adjacent layers, achieving a selectivity ratio typically exceeding 10:1.
Career Highlights
Gary C Hsueh is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in advancing technologies that enhance semiconductor manufacturing processes.
Collaborations
Hsueh has collaborated with notable colleagues, including Chun Yan and Yan Ye, contributing to the innovative environment at Applied Materials, Inc.
Conclusion
Gary C Hsueh's contributions to semiconductor processing through his patents reflect his expertise and commitment to innovation in the field. His work continues to influence the efficiency of semiconductor manufacturing processes, showcasing the importance of advancements in this critical industry.