Daegu, South Korea

Gap Sik Park

This inventor holds 1 USPTO granted patent. Top assignee: Orion Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gap Sik Park. Retrieved from https://idiyas.com/inventor/gap-sik-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Gap Sik Park - Innovator in Plasma Display Technology.

Introduction

Gap Sik Park is a notable inventor based in Daegu, South Korea. He has made significant contributions to the field of display technology, particularly in the development of methods for driving plasma display panels. His innovative approach has the potential to enhance the performance and efficiency of these devices.

Latest Patents

Gap Sik Park holds a patent for a "Method for driving an AC type plasma display panel." This patent describes a technique that maintains a uniform elapse time period between the end of a ramp-down and the application of a first scan pulse. The method involves a comparator in the scan electrode driving circuit that compares output voltage with a reference voltage. When the output voltage equals the reference voltage, a control signal is generated by a logic control circuit. This innovation improves the address characteristics and driving margin of AC type plasma display panels. He has 1 patent to his name.

Career Highlights

Gap Sik Park is associated with Orion Co., Ltd., where he applies his expertise in display technology. His work at the company has been instrumental in advancing the capabilities of plasma display panels.

Collaborations

He collaborates with Hwan Woo Lee, contributing to the development of innovative solutions in their field.

Conclusion

Gap Sik Park's contributions to plasma display technology exemplify the impact of innovative thinking in enhancing electronic display systems. His patent reflects a commitment to improving technology that is widely used in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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