This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2001.
Company Filing History:
Years Active: 2000-2001
Title: Ganming Zhao: Innovator in Semiconductor Technology
Introduction
Ganming Zhao is a notable inventor based in Fukushima, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to etching processes.
Latest Patents
One of his latest patents is titled "Method of obtaining a rounded top trench corner for semiconductor trench etch applications." This invention focuses on a specific sequence of processing steps that lead to the formation of a rounded top corner on a trench in a semiconductor substrate. The method includes providing a film stack with a first layer of patterned material resistant to wet etch solutions and dry etch components, followed by wet etching the second layer to form an undercut and expose the semiconductor substrate. The process culminates in isotropically dry etching the exposed substrate to create a trench with precise control over its dimensions. The rounded top trench corner achieved through this method has a radius ranging from about 150 Å to about 500 Å, with a preference for 200 Å to 350 Å.
Another significant patent by Zhao is the "Non-HBr shallow trench isolation etch process." This invention describes an etchant composition for creating straight-walled, tapered trenches in silicon using chlorine, nitrogen, and a mixture of helium and oxygen. The resulting trenches can be filled with dielectric material without void formation. This etchant is less corrosive than traditional hydrogen bromide-containing etchants, leading to increased chamber life and reduced operational costs.
Career Highlights
Ganming Zhao is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing industry. His work focuses on advancing etching technologies that are crucial for the production of high-performance semiconductor devices.
Collaborations
Zhao has collaborated with notable colleagues, including Jeffrey D. Chinn and Jeff Chinn, contributing to a dynamic work environment that fosters innovation and technological advancement.
Conclusion
Ganming Zhao's contributions to semiconductor technology through his patents reflect his expertise and commitment to innovation. His work continues to influence the industry, paving the way for advancements in semiconductor manufacturing processes.