XIAMEN, China

Gang Ma

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Xiamen Extremely Pq Display Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gang Ma. Retrieved from https://idiyas.com/inventor/gang-ma-wrahgm0e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Gang Ma and Display Panel Technology.

Introduction

Gang Ma is an inventor based in Xiamen, China, associated with Xiamen Extremely PQ Display Technology Co., Ltd. His patent work concerns display-panel components and their bonding structures.

Latest Patents

Ma is credited with 1 patent: “Display Panel, and Light-Emitting Elements and Backplate for Display Panel.” The invention describes a display panel backplate with a first pad and a second pad that serves as a repair pad. Each pad has an adhesive layer and a bonding layer, and each bonding layer consists of multiple single-metal layers. The first bonding layer has a higher bonding temperature than the second, enabling distinct bonding characteristics for the two pads.

Career Highlights

The available information identifies Ma’s work in display technology and his association with Xiamen Extremely PQ Display Technology Co., Ltd. His patent addresses bonding and repair-pad structures used in display panels.

Collaborations

The patent information connects Ma with Xiamen Extremely PQ Display Technology Co., Ltd. No additional collaborators are specified in the provided details.

Conclusion

Gang Ma’s documented invention focuses on layered bonding structures for display-panel backplates, including a repair pad designed with a different bonding temperature.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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