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For the Inventor, By the Inventor

Taoyuan, Taiwan

Gang-Lun Fan

This inventor holds 5 USPTO granted patents and 6 published patent applications. Top assignee: Benq Materials Corporation. Active years: 2021-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gang-Lun Fan. Retrieved from https://idiyas.com/inventor/gang-lun-fan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal5 out of 110 
 
Benq Materials Corporation
 patents

Years Active: 2021-2023

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5 patents (USPTO):Explore Patents
1. 11697741 - Anti-glare film and polarizer with the same (2023-07-11),
2. 11447643 - Hard coating layered optical film, polarizer comprising the same, and image display comprising the hard coating layered optical film and/or the polarizer comprising the same (2022-09-20),
3. 11353629 - Anti-glare film and polarizer with the same (2022-06-07),
4. 11054550 - Anti-reflective film, polarizer comprising the same, and image display comprising the anti-reflective film and/or the polarizer comprising the same (2021-07-06),
5. 11053393 - Hard coating layered optical film, polarizer comprising the same, and image display comprising the hard coating layered optical film and/or the polarizer comprising the same (2021-07-06),

Title: The Innovative Contributions of Gang-Lun Fan

Introduction

Gang-Lun Fan is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of optical materials, particularly in the development of anti-glare films and polarizers. With a total of five patents to his name, Fan's work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is an anti-glare film that comprises a transparent substrate and an anti-glare layer made from an acrylic binder resin, a polyether-modified siloxane, and a plurality of silica nanoparticles. This innovative film provides reliable anti-glare properties with low haze and a fine surface. Another notable invention is a hard coating layered optical film, which includes a polymethyl methacrylate (PMMA) base film and an anti-glare hard coating layer. This layer consists of a (meth)acrylate composition, an initiator, silica nanoparticles, organic microparticles, and a leveling agent. The (meth)acrylate composition features a urethane (meth)acrylate oligomer and various (meth)acrylate monomers, enhancing the film's durability and performance.

Career Highlights

Gang-Lun Fan is currently employed at Benq Materials Corporation, where he continues to innovate and develop new optical materials. His expertise in the field has led to advancements that benefit various applications in display technology.

Collaborations

Fan has collaborated with notable coworkers, including Kuo-Hsuan Yu and Ching-Huang Chen, contributing to a dynamic team focused on research and development in optical materials.

Conclusion

Gang-Lun Fan's contributions to the field of optical materials through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry and improve the quality of optical products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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