Sichuan, China

Gang Li


Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2013-2023

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3 patents (USPTO):Explore Patents

Title: Gang Li - Innovator in Magnetic Field Sensing and LED Technology

Introduction

Gang Li is a prominent inventor based in Sichuan, China. He has made significant contributions to the fields of magnetic field sensing and LED technology. With a total of three patents to his name, his work showcases innovative solutions that enhance the efficiency and functionality of electronic systems.

Latest Patents

Gang Li's latest patents include a passive wireless magnetic field characteristic sensing tag and system, as well as a magnetic field quantity acquisition method. The passive wireless magnetic field characteristic sensing tag integrates a passive magnetic field quantity sensor within an electronic tag. This system works in conjunction with a reader and a host computer to achieve high-precision monitoring of magnetic field quantities. His second patent, the ultrathin LED light engine, features a design that includes a protective cover, a driving circuit board, an aluminum substrate, and at least one LED module. This innovative light engine allows for an ultrathin design while integrating drive and control devices, ensuring effective heat conduction and fixation.

Career Highlights

Throughout his career, Gang Li has worked with notable companies such as Sichuan Sunfor Light Co., Ltd and 02micro Inc. His experience in these organizations has contributed to his expertise in developing cutting-edge technologies.

Collaborations

Gang Li has collaborated with talented individuals in his field, including Wentao Long and Wei Zhao. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Gang Li's contributions to magnetic field sensing and LED technology highlight his role as a leading inventor in these fields. His innovative patents and collaborative efforts continue to influence advancements in technology.

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