Gang Fu

Title: Innovations by Inventor Gang Fu

Introduction

Gang Fu is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of plasma processing systems. With a total of 4 patents to his name, he has demonstrated a strong commitment to advancing technology in this area.

Latest Patents

One of his latest patents is titled "Broadband supply circuitry for a plasma processing system." This invention includes apparatus, plasma processing systems, and methods for dynamic impedance matching across multiple frequency bands of a power source. The method involves amplifying a broadband signal, splitting it across multiple channel paths, and adjusting impedance to achieve optimal performance based on feedback from the broadband signal. Another significant patent is the "Arc management algorithm of RF generator and match box for CCP plasma chambers." This invention focuses on detecting and managing arc events during plasma chamber processes by analyzing impedance data and utilizing machine learning models to suppress arcs effectively.

Career Highlights

Gang Fu works at Applied Materials, Inc., a leading company in the field of materials engineering. His work has been instrumental in developing innovative solutions that enhance the efficiency and reliability of plasma processing systems.

Collaborations

He collaborates with talented individuals such as Tiefeng Shi and Keith A Miller, contributing to a dynamic team that drives innovation in their projects.

Conclusion

Gang Fu's contributions to plasma processing technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in this critical area of technology.