This inventor holds 1 USPTO granted patent. Top assignee: Studiengesellschaft Kohle Mbh. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Günter Dumpich: Innovator in Nanostructure Lithography
Introduction
Günter Dumpich is a notable inventor based in Duisburg, Germany. He has made significant contributions to the field of nanotechnology, particularly through his innovative lithographic processes. His work focuses on the production of nanostructures on surfaces, which has implications for various technological advancements.
Latest Patents
Günter Dumpich holds a patent for a lithographical process aimed at the production of nanostructures on surfaces. This method involves the use of stabilized nanometer-sized transition metal clusters or colloids of metals from specific groups of the Periodic Table. The process allows for the generation of defined structures in the nanometer range after the application of an electron beam and subsequent washing of unexposed portions of the film.
Career Highlights
Throughout his career, Günter Dumpich has been associated with Studiengesellschaft Kohle Mbh, where he has furthered his research and development in nanotechnology. His innovative approaches have positioned him as a key figure in the advancement of lithographic techniques.
Collaborations
Günter has collaborated with notable colleagues such as Manfred T. Reetz and Jens Lohau. These partnerships have contributed to the enhancement of his research and the successful development of his patented technologies.
Conclusion
Günter Dumpich's work in the field of nanostructure lithography exemplifies the innovative spirit of modern science. His contributions continue to influence advancements in nanotechnology and related fields.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile