This inventor holds 1 USPTO granted patent. Top assignee: Obducat Aktiebolag. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Göran Frennesson: Innovator in Electrochemical Etching
Introduction
Göran Frennesson is a notable inventor based in Lund, Sweden. He has made significant contributions to the field of electrochemical etching, particularly through his innovative methods and techniques. His work has implications for various applications in electronics and materials science.
Latest Patents
Göran Frennesson holds a patent for a method of etching, as well as a frame element, mask, and prefabricated substrate element for use in such etching. The patent describes a method where a circuit pattern is transferred to a substrate's surface layer of conductive material by electrochemical etching. To mitigate excessive current densities at the periphery of the central surface area during the etching process, a specially designed frame is utilized. This frame can either be a separate element placed on the substrate or integrated into a resist coating. The innovative approach enhances the precision and efficiency of the etching process.
Career Highlights
Göran Frennesson is associated with Obducat Aktiebolag, a company known for its advancements in nanotechnology and microfabrication. His work at Obducat has allowed him to explore and develop cutting-edge techniques in the field of etching and substrate preparation.
Collaborations
Throughout his career, Göran has collaborated with notable colleagues such as Per Petersson and Mikael Gustavsson. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in their respective fields.
Conclusion
Göran Frennesson is a distinguished inventor whose work in electrochemical etching has paved the way for advancements in various technological applications. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile