Raanana, Israel

Gal Geula

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Gal Geula: Innovator in Power Distribution Systems

Introduction

Gal Geula is a notable inventor based in Raanana, Israel. He has made significant contributions to the field of electrical engineering, particularly in power distribution systems. His innovative approach has led to the development of a unique patent that addresses critical issues in power management.

Latest Patents

Gal Geula holds a patent for a "Redundant power distribution system based on single power source." This electrical power distribution system features a first power bus and a second power bus, both operating within the same voltage range. The system includes eFuse circuits that selectively couple a power source to each bus, ensuring reliability and efficiency. In the event of an electrical fault, the system is designed to maintain power through alternative sources, showcasing Gal's commitment to innovation in electrical safety and efficiency.

Career Highlights

Gal Geula is currently employed at Ree Automotive Ltd., where he continues to develop cutting-edge technologies in the automotive sector. His work focuses on enhancing power distribution systems, which are crucial for the performance and safety of modern vehicles. His expertise in electrical systems has positioned him as a valuable asset to his company.

Collaborations

Gal collaborates with Neta Doron, a fellow innovator at Ree Automotive Ltd. Together, they work on advancing technologies that improve power management and distribution in automotive applications.

Conclusion

Gal Geula's contributions to the field of electrical engineering, particularly through his patented innovations, highlight his role as a leading inventor in power distribution systems. His work not only enhances the efficiency of electrical systems but also ensures greater safety in their application.

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