Sherbrooke, Canada

Gabriel Vezina

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Socpra Sciences Et Genie S.e.c.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gabriel Vezina. Retrieved from https://idiyas.com/inventor/gabriel-vezina

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Gabriel Vezina: Inventor in Gas Adsorbate Capture

Introduction

Gabriel Vezina is an inventor based in Sherbrooke, Canada. His work includes a patented system and method for capturing gas adsorbates through an adsorption and regeneration cycle. He is associated with Socpra Sciences et Genie S.E.C.

Latest Patents

Vezina is credited with 1 patent: “System and Method for Continuous Gas Adsorbate Capture Using Adsorption/Regeneration Cycle.” The invention describes a system with adsorption reactors that receive an adsorbate gas flow and regeneration reactors that receive a regenerative fluid flow. Individual sorbent cells move through a generally continuous cycle between the reactors. In the adsorption reactor, groups of cells form a moving bed that captures adsorbate from the gas flow.

Career Highlights

Vezina’s patent focuses on continuous gas capture using circulating sorbent cells and separate adsorption and regeneration stages. The disclosed approach is designed to maintain a cycle in which cells capture adsorbate and are then regenerated for reuse.

Collaborations

Vezina’s listed coworkers include Alexandre Camire and Martin Brouillette. His association with Socpra Sciences et Genie S.E.C. provides the organizational context for his patent work.

Conclusion

Gabriel Vezina’s patented system addresses continuous gas adsorbate capture by cycling sorbent cells between adsorption and regeneration, reflecting his contribution to gas-treatment technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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