Winsted, CT, United States of America

G H Hayes

This inventor holds 1 USPTO granted patent. Top assignee: Hughes Danbury Optical Systems, Inc.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: G H Hayes. Retrieved from https://idiyas.com/inventor/g-h-hayes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: G H Hayes: Innovator in Optical Metrology

Introduction

G H Hayes is a notable inventor based in Winsted, Connecticut. He has made significant contributions to the field of optical metrology, particularly with his innovative patent that enhances measurement precision.

Latest Patents

Hayes holds a patent for an "Optical thickness profiler using synthetic wavelengths." This optical metrology method and apparatus involves generating and separating three optical wavelengths of fixed polarization into a reference beam and a measurement beam. The measurement beam reflects from the surfaces being analyzed and is combined with the reference beam. Sensors then measure the intensity associated with each wavelength. Any differences in intensity indicate variations in optical path lengths, which can reveal differences in surface characteristics or material properties.

Career Highlights

G H Hayes has worked with Hughes Danbury Optical Systems, Inc., where he has applied his expertise in optical technologies. His work has contributed to advancements in precision measurement techniques, which are crucial in various scientific and industrial applications.

Collaborations

Hayes has collaborated with notable colleagues, including H Eugene Waldenmaier and P J DeGroot, who have also contributed to the field of optical metrology.

Conclusion

G H Hayes is a distinguished inventor whose work in optical metrology has paved the way for improved measurement techniques. His innovative patent reflects his commitment to advancing technology in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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