Orlando, FL, United States of America

G Craig Clabough

This inventor holds 1 USPTO granted patent. Top assignee: Lucent Technologies Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: G Craig Clabough. Retrieved from https://idiyas.com/inventor/g-craig-clabough

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: G Craig Clabough: Innovator in Integrated Circuit Manufacturing

Introduction

G Craig Clabough is a notable inventor based in Orlando, FL (US). He has made significant contributions to the field of integrated circuit manufacturing. His innovative methods have paved the way for advancements in the industry.

Latest Patents

Clabough holds a patent for a "Method for cleaning via openings in integrated circuit manufacturing." This method involves cleaning via openings during the manufacturing process of integrated circuits. The process includes sputter cleaning the via opening and exposing it to a reducing atmosphere. The method may involve alternating between these steps to ensure effective cleaning. This invention is particularly relevant for metal interconnection layers, such as copper, which are prone to oxidation.

Career Highlights

Clabough has worked with Lucent Technologies Inc., where he has applied his expertise in integrated circuit manufacturing. His work has contributed to the development of more efficient manufacturing processes. His innovative approach has garnered attention in the field.

Collaborations

Clabough has collaborated with notable colleagues, including Siddhartha Bhowmik and Joseph William Buckfeller. These collaborations have further enhanced his contributions to the industry.

Conclusion

G Craig Clabough's work in integrated circuit manufacturing exemplifies innovation and dedication. His patent for cleaning via openings showcases his commitment to improving manufacturing processes. His contributions continue to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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